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Specific Process Knowledge/Etch/DRIE-Pegasus/processD: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/processD click here]'''
Mask information
Mask information
* 1 µm of spin coated AZ5214E photoresist, no hardbake
* 1 µm of spin coated AZ5214E photoresist, no hardbake
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