Specific Process Knowledge/Thermal Process/A4 Phosphor Pre-dep furnace

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Phosphorus Predep furnace (A4)

A4 Phosphor Pre-dep furnace. Positioned in cleanroom 2

The Phosphorus Predep furnace (A4) is used to dope Si wafers with phosphorus to make conductive structures, etch stop layers etc. The doping source is phosphoryl chloride (commonly called phosphorus oxychloride) which is a colourless liquid with the formula POCl₃.

A4 is the lowest furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with the Gate Oxide furnace (C2) are the cleanest of all furnaces in the cleanroom. Please be aware of which substrates are allowed to enter this furnace. Check the cross contamination chart.

The user manual, technical information and contact information can be found in LabManager:

Phosphorus Predep furnace (A4)

Process knowledge

• Dope with Phosphorus

Overview of the performance of the Phosphor pre-dep furnace and some process related parameters

Purpose	Doping of Phosphor
Performance		Look at Process knowladge
Process parameter range	Process Temperature	900-1150 oC
	Process pressure	1 atm
	Gasses on the system	POCl3, N2
Substrates	Batch size	1-30 4" wafer (or 2" wafers) per run
	Substrate material allowed	Silicon wafers (new from the box or RCA cleaned) In doubt: look at the cross contamination chart or please send a mail to furnace@danchip.dtu.dk