Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
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[[Image:KOH_4tommer.jpg|225x225px|thumb|BHF between the KOH baths: positioned in cleanroom 3. This is primarily used to remove oxide before and after a KOH etch]] | [[Image:KOH_4tommer.jpg|225x225px|thumb|BHF between the KOH baths: positioned in cleanroom 3. This is primarily used to remove oxide before and after a KOH etch]] | ||
[[Image:Fumehoodetch-chrom2.jpg|225x225px|thumb|PP-bath: positioned in fume hood in cleanromm 2]] | [[Image:Fumehoodetch-chrom2.jpg|225x225px|thumb|PP-bath: positioned in fume hood in cleanromm 2]] | ||
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