Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
| Line 45: | Line 45: | ||
*PolySi | *PolySi | ||
*Blue film | *Blue film | ||
In RCA bench: | |||
*No masking material | |||
| | | | ||
In '''plastic''' beaker or PP-bath in the fume hood in cleanroom 2: | In '''plastic''' beaker or PP-bath in the fume hood in cleanroom 2: | ||