Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions
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*[[/Si etch using ASE|ASE (Advanced Silicon Etch)]] | *[[/Si etch using ASE|ASE (Advanced Silicon Etch)]] | ||
*[[Specific Process Knowledge/Etch/DRIE-Pegasus|DRIE-Pegasus (Silicon Etch)]] | *[[Specific Process Knowledge/Etch/DRIE-Pegasus|DRIE-Pegasus (Silicon Etch)]] | ||
*[[Specific Process Knowledge/Etch/IBE | *[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab 300]] | ||
==Comparison methode 1 and methode 2 for the process== | ==Comparison methode 1 and methode 2 for the process== | ||