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| Line 258: |
Line 258: |
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| |-style="background:LightGrey; color:black"
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| !Resist thickness range
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| *~0.5µm to 20µm?
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| *~50nm to 2µm?
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| *~30nm to 0.5 µm
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| *~20nm to 10µm?
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| *?nm - ?µm
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| |-style="background:WhiteSmoke; color:black"
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| !Typical exposure time
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| 2s-30s pr. wafer
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| ?-? pr. ?
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| ?-? pr. µm2
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| ? pr. wafer
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| ? pr. µm2
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