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| == Sample imaging == | | == Sample imaging == |
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| The list of instruments for sample imaging available at Danchip includes 6 optical microscopes , three scanning electron microscopes (SEM's) and an atomic force microscope (AFM). These instruments cover a wide range of applications.
| | A Danchip a number of instruments are available for sample imaging, including a several optical microscopes, an optical profiler, three SEMs (scanning electron micrscopes), an AFM (atomic force microscope) and two stylus profilers (Dektak). These instruments cover wide range of applications. |
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| Deposition of silicon nitride can be done with either LPCVD (Low Pressure Chemical Vapor Deposition) or PECVD (Plasma Enhanced Chemical Vapor Deposition). Stiochiometric nitride or silicon rich (low stress) LPCVD nitride is deposited on a batch of wafers in a LPCVD nitride furnace, and PECVD nitride (or oxynitride) is deposited on a few samples at a time in a PECVD system. LPCVD nitride has a good step coverage and a very good uniformity. Using PECVD it is possible to deposit a thicker layer of nitride on different types of samples, but the nitride does not cover sidewalls very well.
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| *[[Specific_Process_Knowledge/Characterization/Optical_microscope|Sample imaging using optical microscopes]] | | *[[Specific_Process_Knowledge/Characterization/Optical_microscope|Sample imaging using optical microscopes]] |
