Specific Process Knowledge/Lithography: Difference between revisions
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Resist type | !Resist type | ||
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*UV sensitive: | |||
**AZ | |||
**SU8 | |||
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*DUV sensitive | |||
**fff | |||
| | |||
*E-beam sensitive | |||
**ZEP502A | |||
**SU8 | |||
| | |||
*Imprint polymers: | |||
**?? | |||
| | |||
*?? sensitive: | |||
**?? | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
!Resist thickness range | |||
| | |||
*~0.5µm to 20µm? | |||
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*~50nm to 2µm? | |||
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*~20nm to 1µm? | |||
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*~20nm to 10µm? | |||
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*?nm - ?µm | |||
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|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!Exposure time | |||
| | | | ||
*UV sensitive: | *UV sensitive: | ||