Jump to content

Specific Process Knowledge/Lithography: Difference between revisions

← Older editNewer edit →
VisualWikitext
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
Line 44: Line 44:
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Parameter 1
!PAttern size range
|
|
*A
*~1µm and up
*B
|
|
*A
*~200nm and up
*B
|
|
*A
*~20nm and up
*B
|
|
*A
*~20nm and up
*B
|
|
*A
*3D ?nm
*B
|-
|-


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography"