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Comparing Lithography methodes at Danchip

There are a broad varity of lithography methodes at Danchip. The mothodes are compared here to make it easier for you to compare and choose the one that suits your needs.

Process description using methode 1

Process description using methode 2

Comparison methode 1 and methode 2 for the process

	Methode 1	Methode 2
Generel description	Generel description - methode 1	Generel description - methode 2
Parameter 1	A B	A B
Parameter 2	A B C	A
Substrate size	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers
Allowed materials	Allowed material 1 Allowed material 2	Allowed material 1 Allowed material 2 Allowed material 3

@@ Line 6: / Line 6: @@
 <!-- Replace "http://labadviser.danchip.dtu.dk/..." wih the link to the Labadviser page-->
-== Name of process ==
+== Comparing Lithography methodes at Danchip ==
-Write a short description of the process and how to perform the process.
+There are a broad varity of lithography methodes at Danchip. The mothodes are compared here to make it easier for you to compare and choose the one that suits your needs.
 *[[/Deposition of silicon nitride using LPCVD|Process description using methode 1]]