Specific Process Knowledge/Etch/DRIE-Pegasus/processB: Difference between revisions
Appearance
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{| | {| | ||
| STYLE="vertical-align: top"| | | STYLE="vertical-align: top"| | ||
{| border = | {| border = 1 | ||
|+ '''Wafers''' | |+ '''Wafers''' | ||
|- | |- | ||
! width=" | ! width="100" |Wafer number | ||
! width=" | ! width="100" |Mask | ||
! width=" | ! width="100" |Process B duration | ||
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| 2 | | 2 | ||
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|+ '''Wafers''' | |+ '''Wafers''' | ||
|- | |- | ||
! width=" | ! width="100" |Wafer number | ||
! width=" | ! width="100" |Mask | ||
! width=" | ! width="100" |Process B duration | ||
|- | |- | ||
| 11 | | 11 | ||