|
|
| Line 98: |
Line 98: |
| {| | | {| |
| | STYLE="vertical-align: top"| | | | STYLE="vertical-align: top"| |
| {| border = 1 | | {| border = 0 |
| |+ '''Wafers''' | | |+ '''Wafers''' |
| |- | | |- |
| Line 162: |
Line 162: |
| |} | | |} |
| |} | | |} |
|
| |
|
| |
|
| |
|
| |
| {|
| |
| | STYLE="vertical-align: top"|
| |
| {| border = 1
| |
| |+ '''Travka 05: A-line 2 µm to 25 µm fields'''
| |
| ! width="50" |Trench width (µm)
| |
| ! width="50" |Ridge width (µm)
| |
| ! width="50" |Period width (µm)
| |
| ! width="50" |Total periods
| |
| ! width="50" |Width of array (µm)
| |
| |-
| |
| |2||38||40||2||80
| |
| |-
| |
| |3||57||60||3||180
| |
| |-
| |
| |4||76||80||2||160
| |
| |-
| |
| |6||114||120||1||120
| |
| |-
| |
| |8||152||160||1||160
| |
| |-
| |
| |10||190||200||1||200
| |
| |-
| |
| |15||285||300||1||300
| |
| |-
| |
| |25||475||500||1||500
| |
| |}
| |
| | STYLE="vertical-align: top"|
| |
| {| border = 1
| |
| |+ '''Travka 05: A-line 40 µm to 300 µm fields'''
| |
| |-
| |
| ! width="50" |Trench width (µm)
| |
| ! width="50" |Ridge width (µm)
| |
| ! width="50" |Period width (µm)
| |
| ! width="50" |Total periods
| |
| ! width="50" |Width of array (µm)
| |
| |-
| |
| |40||760||800||1||800
| |
| |-
| |
| |50||950||1000||1||1000
| |
| |-
| |
| |75||1425||1500||1||1500
| |
| |-
| |
| |100||1900||2000||1||2000
| |
| |-
| |
| |150||2850||3000||1||3000
| |
| |-
| |
| |200||3800||4000||1||4000
| |
| |-
| |
| |300||5700||6000||1||6000
| |
| |}
| |
| |}
| |
|
| |
|
| |
|
| <gallery caption="The results of process B after 17 and 34 cycles of etching" widths="500" heights="350" perrow="2"> | | <gallery caption="The results of process B after 17 and 34 cycles of etching" widths="500" heights="350" perrow="2"> |
