Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions

@@ Line 4: / Line 4: @@
 ! colspan="3" align="center"| Multiplexed parameters
 |-
-| Parameter
+! Parameter
-| Setting
+! Setting
-| Parameter
+! Parameter
-| Etch
+! Etch
-| Pass
+! Pass
 |-
-| Temperature
+! Temperature
 | 10<sup>o</sup>C
-| SF<sub>6</sub> Flow
+! SF<sub>6</sub> Flow
 | 230 sccm
 | 0 sccm
 |-
-| No. of cycles
+! No. of cycles
 | 31
-| O<sub>2</sub> Flow
+! O<sub>2</sub> Flow
 | 23 sccm
 | 0 sccm
 |-
-| Process time
+! Process time
 | 5:56 mins
-| C<sub>4</sub>F<sub>4</sub> Flow
+! C<sub>4</sub>F<sub>4</sub> Flow
 | 0 sccm
 | 120 sccm
 |-
-| APC mode
+! APC mode
 | manual
-| Ar Flow
+! RF coil
-| 0 sccm
+| 2800 W
-| 0 sccm
+| 1000 W
 |-
-| APC setting
+! APC setting
 | 86.8 %
-| RF coil
+! RF Platen
-| 2800 W
+| 16 W
-| 1000 W
+| 0 W
 |-
 |}