Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions
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{| border="1" cellpadding="5" cellspacing="10" | {| border="1" cellpadding="5" cellspacing="10" | ||
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! colspan="2" align="center"| Common parameters | ! colspan="2" align="center"| Common parameters | ||
!colspan="3" align="center"| Multiplexed parameters | ! colspan="3" align="center"| Multiplexed parameters | ||
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| | | Parameter | ||
| | | Setting | ||
| | | Parameter | ||
| Etch | |||
| Pass | |||
|- | |- | ||
| C | | C | ||
| D | | D | ||
|- | |- | ||