Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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The SEM that will cover most users needs is the [[/Leo|Leo SEM]]. It is very reliable and rugged instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session before they are free to use it by themselves. It is a standard high vacuum instrument equipped with a field emission gun, 3 high vacuum electron detectors (Se2, Inlens and RBSD) and a Röntec EDX system. You can obtain excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers. | The SEM that will cover most users needs is the [[/Leo|Leo SEM]]. It is very reliable and rugged instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session before they are free to use it by themselves. It is a standard high vacuum instrument equipped with a field emission gun, 3 high vacuum electron detectors (Se2, Inlens and RBSD) and a Röntec EDX system. You can obtain excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers. | ||
The popularity and need for the [[/Leo|Leo SEM]] is however such that a 'maximum 2 hour per session' policy is necessary - so it may be difficult to get access to it. The less advanced [[/Jeol|Jeol SEM]] offers a great alternative for many types of SEM needs. If you have to check the result of an etch process, a lift-off etc. before you proceed with the process sequence, the [[/Jeol|Jeol SEM]] is a much better choice. It is simple, faster to use, has a very low sample exchange time and is by far more accessible than the Leo SEM. There is a very good chance that it is free when you need it. On | The popularity and need for the [[/Leo|Leo SEM]] is however such that a 'maximum 2 hour per session' policy is necessary - so it may be difficult to get access to it. The less advanced [[/Jeol|Jeol SEM]] offers a great alternative for many types of SEM needs. If you have to check the result of an etch process, a lift-off etc. before you proceed with the process sequence, the [[/Jeol|Jeol SEM]] is a much better choice. It is simple, faster to use, has a very low sample exchange time and is by far more accessible than the Leo SEM. There is a very good chance that it is free when you need it. On heavily charging polymers such as SU-8 it even does a better job. To use it, a 1-2 hour training session is necessary. | ||
The new [[/FEI|FEI SEM]] is our most advanced SEM. | |||