Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | ||
The SEM that will cover most users needs is the [[/Leo|Leo SEM]]. It is very reliable and rugged instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session before they are free to use it by themselves. It is a standard high vacuum instrument equipped with a field emission gun, 3 high vacuum electron detectors (Se2, Inlens and RBSD) and a Röntec EDX system. You can obtain excellent images on a large variety of materials such as | The SEM that will cover most users needs is the [[/Leo|Leo SEM]]. It is very reliable and rugged instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session before they are free to use it by themselves. It is a standard high vacuum instrument equipped with a field emission gun, 3 high vacuum electron detectors (Se2, Inlens and RBSD) and a Röntec EDX system. You can obtain excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers. | ||
The popularity and need for the [[/Leo|Leo SEM]] is however such that a 'maximum 2 hour per session' policy is necessary - so it may be difficult to get access to it. The less advanced [[/Jeol|Jeol SEM]] offers a great alternative for many types of SEM needs. For verification of process steps | |||