Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions

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 At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.
-The SEM that will cover most users needs is the [[/Leo|Leo SEM]]. It is a very reliable and rugged instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session before they are free to use it by themselves.
+The SEM that will cover most users needs is the [[/Leo|Leo SEM]]. It is very reliable and rugged instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session before they are free to use it by themselves. It is a standard high vacuum instrument equipped with a field emission gun, 3 high vacuum electron detectors (Se2, Inlens and RBSD) and a Röntec EDX system.
-The [[/Leo|Leo SEM]] is a standard instrument with a field emission gun and 3 high vacuum detectors, the Se2, Inlens and RBSD. A Röntec
 ==[[/FEI | FEI SEM]] - ''FEI Nova 600 NanoSEM'' ==