Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | ||
==[[/FEI | FEI SEM]] - ''FEI Nova 600 NanoSEM''== | ==[[/FEI | FEI SEM]] - ''FEI Nova 600 NanoSEM'' == | ||
==[[/ | ==[[/Leo | Leo SEM]] - ''Leo 1550 '' == | ||
==[[/ | ==[[/Jeol | Jeol SEM]] - ''Jeol JSM 5500 LV '' == | ||
Revision as of 16:17, 24 November 2007
At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.