Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

@@ Line 43: / Line 43: @@
 {|
 | *SF<sub>6</sub>: 0-100 sccm
- *O<sub>2</sub>: 0-100 sccm
+| *O<sub>2</sub>: 0-100 sccm
+|-
 | *C<sub>4</sub>F<sub>8</sub>: 0-100 sccm
- *Ar: 0-100 sccm
+| *Ar: 0-100 sccm
+|-
 | *CF<sub>4</sub>: 0-100 sccm
+| *H<sub>2</sub>: 0-30 sccm
+|-
+| *CH<sub>4</sub>: 0-50 sccm
+| *BCl<sub>3</sub>: 0-100 sccm
 |-
-|*H<sub>2</sub>: 0-30 sccm
+| *Cl<sub>2</sub>: 0-100 sccm
-|*CH<sub>4</sub>: 0-50 sccm
+| *HBr: 0-100 sccm
-|*BCl<sub>3</sub>: 0-100 sccm
-|*Cl<sub>2</sub>: 0-100 sccm
-|*HBr: 0-100 sccm
 |}
 |-