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Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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1,918 edits
Line 42: Line 42:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
{|
{|
|*SF<sub>6</sub>: 0-100 sccm
| *SF<sub>6</sub>: 0-100 sccm
|*O<sub>2</sub>: 0-100 sccm
*O<sub>2</sub>: 0-100 sccm
|*C<sub>4</sub>F<sub>8</sub>: 0-100 sccm
| *C<sub>4</sub>F<sub>8</sub>: 0-100 sccm
|*Ar: 0-100 sccm
*Ar: 0-100 sccm
|*CF<sub>4</sub>: 0-100 sccm
| *CF<sub>4</sub>: 0-100 sccm
|-
|-
|*H<sub>2</sub>: 0-30 sccm
|*H<sub>2</sub>: 0-30 sccm
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