Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/nanoetch/211nmzep: Difference between revisions

From LabAdviser
Jml (talk | contribs)
Created page with "<gallery caption="The profiles of the 340 nm zep resist" widths="250" heights="200" perrow="3"> image:WF_2E02_mar23_2011-030.jpg|The 30 nm zep profile image:WF_2E02_mar23_2011..."
 
Jmli (talk | contribs)
No edit summary
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon/nano/nanoetch/180nmzep click here]'''
<gallery caption="The profiles of the 340 nm zep resist" widths="250" heights="200" perrow="3">
<gallery caption="The profiles of the 340 nm zep resist" widths="250" heights="200" perrow="3">
image:WF_2E02_mar23_2011-030.jpg|The 30 nm zep profile
image:WF_2E02_mar23_2011-030.jpg|The 30 nm zep profile

Revision as of 12:13, 22 October 2013

Feedback to this page: click here