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| == Recipes on the Metal Etcher == | | == Recipes on the Metal Etcher == |
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| ===Chromium etch===
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| The Chromium etch has ONLY been carried out on the following substrate stack:
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| The Chromium is sputter deposited onto a 2" quartz wafer and pattered by e-beam with Zep520A resist.
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| This 2" QZ wafer is bonded with crystal bond to a 65mmx65mm quartz plate with the thickness: 6.35mm.
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| This QZ plate is bonded to a Si wafer.
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| {| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
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| |+ '''Cr etch'''
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| |-
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| ! Parameter
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| |'''Cr etch'''
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| |-
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| ! Cl<sub>2</sub> (sccm)
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| | 65
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| |-
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| ! O<sub>2</sub> (sccm)
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| | 15
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| |-
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| ! Pressure (mTorr)
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| | 15
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| |-
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| ! Coil power (W)
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| | 300
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| |-
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| ! Platen power (W)
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| | 15
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| |-
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| ! Temperature (<sup>o</sup>C)
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| | 50 (no back side cooling)
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| |-
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| ! Spacers (mm)
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| | 100
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| |-
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| ! Etch rate (nm/min)
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| | ~14
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| |-
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| !Zep520A resist selectivity
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| | ~0.9
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| |-
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| !Comment
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| | .
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| |}
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| === Etching of nanostructures in silicon === | | === Etching of nanostructures in silicon === |
