Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions
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|style="background:LightGrey; color:black"|Gas flows | |style="background:LightGrey; color:black"|Gas flows | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*SF<sub> | *SF<sub>6</sub>: 0-600 sccm | ||
*O<sub> | *O<sub>2</sub>: 0-100 sccm | ||
*C<sub> | *C<sub>4</sub>F<sub>8</sub>: 0-300 sccm | ||
*Ar: 0-100 sccm | *Ar: 0-100 sccm | ||
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