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Line 164: |
| * Jeol | | * Jeol |
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| |}
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| {| border="2" cellspacing="0" cellpadding="4" align="center"
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| !
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| !SEM - Zeiss
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| !SEM - FEI
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| !SEM - Leo
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| !SEM - Jeol
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| |-
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| !Model
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| |Zeiss Supra 55 VP
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| |FEI Nova 600 NanoSEM
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| |Leo 1550 SEM
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| |Jeol JSM 5500 LV SEM
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| |-
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| !Substrate size
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| |Up to 6" wafer with full view
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| |Up to 6" wafer with 4" full view
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| |Up to 4" wafer with full view
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| |-
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| !Additional equipment
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| |Kleindiek micromanipulator with Capres 4 point probe
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| |-
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| !EDX analysis
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| |Oxford Inca system
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| |Röntec system
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| |Not available
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| |-
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| |} | | |} |
