Specific Process Knowledge/Characterization/Four-Point Probe: Difference between revisions
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==Four-Point Probe== | ==Four-Point Probe== | ||
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The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose is to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer. | The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose is to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer. | ||
Revision as of 14:16, 21 October 2013
Four-Point Probe
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The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose is to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.
The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.
The user manual, technical information and contact information can be found in LabManager:
| Purpose | Resistance and resistivity measurement | |
|---|---|---|
| Process parameter range | Process Temperature |
|
| Process pressure |
| |
| Substrates | Batch size |
|
| Substrate material allowed |
|