Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions

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-*leo
+* X, Y: 125*100 mm
+* T: 0 to 90<sup>o</sup>
+* R: 360<sup>o</sup>
+* Z: 48 mm
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-*zeiss
+* X, Y: 130*130 mm
+* T: -4 to 70<sup>o</sup>
+* R: 360<sup>o</sup>
+* Z: 50 mm
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-*fei
+* X, Y: 150*150 mm
+* T: -10 to 60<sup>o</sup>
+* R: 360<sup>o</sup>
+* Z: 10 mm
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-*jeol
+* X, Y: 73*40 mm
+* T: -10 to 90<sup>o</sup>
+* R: 360<sup>o</sup>
+* Z: 38 mm
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 |style="background:LightGrey; color:black"|Sample sizes
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-* Leo
+* X, Y, Z, R and T
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-* Zeiss
+* Up to 6" wafer with full view
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-* Fei
+* Up to 6" wafer with full view
+* A 12" wafer holder has been made but it requires special training
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-* Leo
+* Up to 4" wafer
 |-
 | style="background:LightGrey; color:black"|Allowed materials