Specific Process Knowledge/Thermal Process/Resist Pyrolysis Furnace: Difference between revisions
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|style="background:LightGrey; color:black"|Batch size | |style="background:LightGrey; color:black"|Batch size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Several small samples (placed on Si support wafers) | *Several small samples (placed on a Si support wafers) | ||
*One-six 50 mm wafers (placed on Si support wafers) | *One-six 50 mm wafers (placed on a Si support wafers) | ||
*One-six 100 mm wafers | *One-six 100 mm wafers | ||
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