Specific Process Knowledge/Thermal Process/Resist Pyrolysis Furnace: Difference between revisions

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 |style="background:LightGrey; color:black"|Temperature
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-*0-1000 <sup>o</sup>C
+*0-1000<sup>o</sup>C
-*Temperature ramp-up rate: Max 10 <sup>o</sup>C/min
+*Temperature ramp-up rate: Max 10<sup>o</sup>C/min
 *Temperature ramp-down rate: Relative slow (depending on the furnace temperature)
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 |style="background:LightGrey; color:black"|Batch size
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-*<nowiki>#</nowiki> Small samples (placed on a Si support wafer)
+*Several small samples (placed on Si support wafers)
-*<nowiki>#</nowiki> 50 mm wafers (placed on a Si support wafer)
+*One-six 50 mm wafers (placed on Si support wafers)
-*<nowiki>#</nowiki> Up to two or six 100 mm wafers or
+*One-six 100 mm wafers
-The furnace has a quartz boat for 3" wafers. One or two 4" wafers can be placed horizontally on the boat. It is also possible to process 2" wafers or smaller samples if these are placed on a Si support wafer, preferentially with an etched recess to prevent that the samples fall off during processing.
-The furnace also has a horizontal quartz boat in which up to six wafers can be placed horizontally. Place the horizontal boat on the quartz boat for 3" wafers, and be very careful when you load your wafers in the boat. The horizontal boat should only be handled with new gloves, and it has to be situated in a clean wafer box (situated on the shelf next to the furnace and marked "Horizontal boat for Resist Pyrolysis Furnace") when it is not in use.
 |-
 | style="background:LightGrey; color:black"|Allowed materials