Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
Appearance
No edit summary |
|||
| Line 1: | Line 1: | ||
[[image:SEM-Leo.jpg|200x200px|right|thumb|The Leo SEM]] | [[image:SEM-Leo.jpg|200x200px|right|thumb|The Leo SEM]] | ||
[[image:SEM-FEI-1.jpg|200x200px|right|thumb|The FEI SEM]] | [[image:SEM-FEI-1.jpg|200x200px|right|thumb|The FEI SEM]] | ||
[[image:SEM-Jeol.jpg|200x200px|right|thumb|The Jeol SEM is located outside the cleanroom in the basement ]] | [[image:SEM-Jeol.jpg|200x200px|right|thumb|The Jeol SEM is located outside the cleanroom in the basement ]] | ||
== Scanning electron microscopy at Danchip== | |||
The four SEM's at Danchip cover a wide range of needs both in the cleanroom and outside: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | The four SEM's at Danchip cover a wide range of needs both in the cleanroom and outside: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | ||