Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions

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-== Etching using the dry etch technique RIE (Reactive Ion Etch) ==
+== Scanning electron microscopy at Danchip==
-[[image:Cluster1.jpg|200x200px|right|thumb|RIE1 (part of Cluster1) - positioned in cleanroom2]]
-[[image:Cluster2.jpg|200x200px|right|thumb|RIE2 (part of Cluster2)- positioned in cleanroom3]]
+The four SEM's at Danchip cover a wide range of needs both in the cleanroom and outside: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.
-At Danchip we have three RIE's. Two (RIE1 and RIE2) for etching silicon based materials, resist and polymers (mainly RIE2) and one (III-V RIE) for etching III-V materials. Here only RIE1 and RIE2 will be described.
+The 'workhorse' SEM that will cover most users needs is the [[/Leo|Leo SEM]]. It is a very reliable and rugged instrument that provides high quality images of most samples. Excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers may be acquired on the [[/Leo|Leo SEM]]. As such, we prefer that new users that have no prior SEM experience get trained on the Leo SEM before they start using the FEI or Zeiss.
+The [[/Zeiss|Zeiss SEM]] is the newest SEM in the cleanroom. It's a state-of-the-art SEM that will produce excellent images on most samples. Operated by the same user interface as the Leo, it is quite straight forward to change between the two instruments.
+[[image:SEM-FEI-1.jpg|200x200px|right|thumb|The FEI SEM has its own dedicated room: Cleanroom 10]]
+The [[/FEI|FEI SEM]] was acquired to cope with the growing need for polymer related imaging. It is a versatile microscope with two vacuum modes (High Vacuum and Low Vacuum) and 6 different detectors, offering excellent resolution on any type of sample or material. This great performance, however, requires a skilled operator that knows how to achieve it. Also, we have learned that the high degree of sophistication and the great number of detectors make it much less robust compared to the other SEM's. It is therefore the intention that only users with special needs (for instance thick polymers, glass substrates or EDX/micromanipulator experiments) that will be trained. Furthermore, the instrument is equipped with a Oxford Inca EDX system and a Kleindiek micromanipulator with a Capres 4 point probe.
+[[image:SEM-Jeol.jpg|200x200px|right|thumb|The Jeol SEM is located outside the cleanroom in the basement ]]
+[[/Jeol|Jeol SEM]]
+Outside the cleanroom in the basement of building 347, the [[/Jeol|Jeol SEM]] provides a possibilty
-The hardware of RIE1 and RIE2 is very similar, but you cannot count on that identical recipes on RIE1 and RIE2 perform exactly the same. In addition to that the main difference between RIE1 and RIE2 is the cleanness of the two equipment. In rough terms RIE1 is the clean system and the RIE2 is the dirty system. This means that in RIE2 opposed to RIE1 it is allowed to have small amounts of metals exposed to the plasma.
 '''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:'''
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-=The Scanning Electron Microscopes at Danchip =
 [[image:SEM-Leo.jpg|200x200px|right|thumb|The Leo SEM has its own dedicated room: Cleanroom 9]]