Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace: Difference between revisions
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== | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/A1_Bor_Drive-in_furnace click here]''' | ||
==Boron Drive-in furnace (A1)== | |||
[[Image:A1.JPG|thumb|300x300px|A1 Bor Drive-in furnace. Positioned in cleanroom 2]] | [[Image:A1.JPG|thumb|300x300px|A1 Bor Drive-in furnace. Positioned in cleanroom 2]] | ||
The | The Boron Drive-in furnane (A1) is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide, drive-in of boron after a pre-deposition and oxidation of the boron phase layer. Boron pre-deposition takes place in the Boron Predep furnace (A2). The Boron Drive-in furnace can also be used for drive-in of boron which has been ion implanted. | ||
The Boron Drive-in furnace is the top furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with the Gate Oxide furnace (C1) are the cleanest of all furnaces in the cleanroom. Please be aware of which substrates that are allowed to enter this furnace. Check [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 the cross contamination chart]. | |||
'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | '''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=47 | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=47 Boron Drive-in furnace (A1)]''' | ||
==Process knowledge== | ==Process knowledge== | ||