Specific Process Knowledge/Characterization/Four-Point Probe: Difference between revisions
| Line 6: | Line 6: | ||
[[Image:4pointprobe.jpg|thumb|300x300px|Four point probe: positioned in cleanroom 4]] | [[Image:4pointprobe.jpg|thumb|300x300px|Four point probe: positioned in cleanroom 4]] | ||
'''The user manual,technical information and contact information can be found in LabManager:''' | '''The user manual, technical information and contact information can be found in LabManager:''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=163 Four point probe]''' | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=163 Four point probe]''' | ||
Revision as of 10:35, 3 December 2012
Four-Point Probe
The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose is to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.
The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.
The user manual, technical information and contact information can be found in LabManager:
| Purpose | Resistance and resistivity measurement | |
|---|---|---|
| Process parameter range | Process Temperature |
|
| Process pressure |
| |
| Substrates | Batch size |
|
| Substrate material allowed |
|