Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|RF powers | ||
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* | * Coil Power 5 kW | ||
* Platen power 300/500 W (HF/LF) | |||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|Gas flows | ||
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* | * SF | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||