Specific Process Knowledge/Characterization/Four-Point Probe: Difference between revisions

Revision as of 11:04, 29 November 2012

Four-Point Probe

The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose it to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.

The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.

The user manual,technical information and contact information can be found in LabManager:

Four point probe

Overview of the performance of the Four-Point Probe and some process related parameters

Purpose		Resistance and resistivity measurement
Performance		Look at the process knowlege
Process parameter range	Process Temperature	room temperature
Process parameter range	Process pressure	1 atm
Substrates	Batch size	1 4" wafer per measurement
Substrates	Substrate material allowed	Silicon wafers (new from the box or RCA cleaned)

@@ Line 16: / Line 16: @@
 !style="background:silver; color:black;" align="center"|Purpose
 |style="background:LightGrey; color:black"|
-|style="background:WhiteSmoke; color:black"|
+|style="background:WhiteSmoke; color:black"| Resistance and resistivity measurement
 |-
@@ Line 24: / Line 24: @@
 Look at the process knowlege
 |-
-!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameter range
+!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
 |style="background:LightGrey; color:black"|Process Temperature
 |style="background:WhiteSmoke; color:black"|
-*900-1150 <sup>o</sup>C
+*room temperature
 |-
 |style="background:LightGrey; color:black"|Process pressure
 |style="background:WhiteSmoke; color:black"|
 *1 atm
-|-
-|style="background:LightGrey; color:black"|Gasses on the system
-|style="background:WhiteSmoke; color:black"|
-*Ar, N<sub>2</sub>
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates
 |style="background:LightGrey; color:black"|Batch size
 |style="background:WhiteSmoke; color:black"|
-*1-30 4" wafer (or 2" wafers) per run
+*1 4" wafer per measurement
 |-
 | style="background:LightGrey; color:black"|Substrate material allowed
 |style="background:WhiteSmoke; color:black"|
 *Silicon wafers (new from the box or RCA cleaned)
-*In doubt: look at [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 the cross contamination chart] or send a mail to [mailto:furnace@danchip.dtu.dk the Furnace group].
 |-
 |}