Specific Process Knowledge/Characterization/Four-Point Probe: Difference between revisions

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 ==Four-Point Probe==
-The four-Point Probe is used to make I/V measurement for resistance and resistivity measurement. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.
+The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose it to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.
-The four pins are pushed on the surface and a measurement is performed. It works only for 4" wafers because a special holder is need.
+The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.
 [[Image:4pointprobe.jpg|thumb|300x300px|Four point probe: positioned in cleanroom 4]]