Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions
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'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_Nitride) click here]''' | |||
==LPCVD (Low Pressure Chemical Vapor Deposition) Silicon Nitride== | ==LPCVD (Low Pressure Chemical Vapor Deposition) Silicon Nitride== | ||
[[image:DC_nyhed_3.jpg|300x300px|right|thumb|6" LPCVD nitride furnace (new nitride furnace) positioned in cleanroom 14]] | [[image:DC_nyhed_3.jpg|300x300px|right|thumb|6" LPCVD nitride furnace (new nitride furnace) positioned in cleanroom 14]] | ||