Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions
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At moment there is only a standard recipe for deposition of silicon rich nitride (SRN) on 4" wafers on the 4" nitride furnace. On the 6" nitride furnace there are two standard recipes for deposition of stoichiometric nitride (Si<sub>3</sub>N<sub>4</sub>), one for 4" wafers and one for 6" wafers. | At moment there is only a standard recipe for deposition of silicon rich nitride (SRN) on 4" wafers on the 4" nitride furnace. On the 6" nitride furnace there are two standard recipes for deposition of stoichiometric nitride (Si<sub>3</sub>N<sub>4</sub>), one for 4" wafers and one for 6" wafers. | ||
'''The user manual(s), quality control procedure(s) and results, technical information and contact information can be found in LabManager:''' | |||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=84 LPCVD Nitride 100 mm furnace (B2)]''' | |||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=250 LPCVD Nitride 150 mm furnace (E2)]''' | |||
==Process Knowledge== | ==Process Knowledge== | ||