Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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At the moment we have three SEM's. | At the moment we have three SEM's. | ||
=FEI SEM= | |||
== Technical specifcations == | == Technical specifcations == | ||
=Sample requirements= | ===Sample requirements=== | ||
*The Nova NanoSEM analyzes a variety of samples, however, excluded are samples that may degas, disintegrate or produce dust/particles. Therefore, no wet polymers, powders etc. If you have any questions, please ask Jonas. | *The Nova NanoSEM analyzes a variety of samples, however, excluded are samples that may degas, disintegrate or produce dust/particles. Therefore, no wet polymers, powders etc. If you have any questions, please ask Jonas. | ||
= Sample sizes= | === Sample sizes=== | ||
*Up to 6" wafers. | *Up to 6" wafers. | ||
= SEM modes = | === SEM modes === | ||
* Mode 1: High Resolution SEM mode: This is the standard operation mode associated with SEM. | * Mode 1: High Resolution SEM mode: This is the standard operation mode associated with SEM. | ||
* Mode 2: Ultra High Resolution SEM mode: Magnetic fields generated in the chamber act as a virtual lens that engulfes the sample. Using this semi-immersion lens increased resolution may be achieved at high magnifications. | * Mode 2: Ultra High Resolution SEM mode: Magnetic fields generated in the chamber act as a virtual lens that engulfes the sample. Using this semi-immersion lens increased resolution may be achieved at high magnifications. | ||
* Mode 3: EDX mode: Similar to Mode 1, but the electrons are trapped using a magnetic field. | * Mode 3: EDX mode: Similar to Mode 1, but the electrons are trapped using a magnetic field. | ||
= Lateral resolution= | === Lateral resolution=== | ||
The resolution that may be achieve is highly dependent on the type of sample and SEM operator skills. In the best cases one may expect: | The resolution that may be achieve is highly dependent on the type of sample and SEM operator skills. In the best cases one may expect: | ||
* High Vacuum operation: | * High Vacuum operation: | ||
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1.8 nm at 3 kV (Helix detector and optimum working distance) | 1.8 nm at 3 kV (Helix detector and optimum working distance) | ||
= Acceleration voltage= | === Acceleration voltage=== | ||
* 200 V - 30 kV | * 200 V - 30 kV | ||
= Detectors= | === Detectors=== | ||
* ETD: In chamber SE Detector (Everhardt Thornley Detector) | * ETD: In chamber SE Detector (Everhardt Thornley Detector) | ||
* TLD: Inlens SE detector (Through Lens Detector) | * TLD: Inlens SE detector (Through Lens Detector) | ||
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* EDX: Liquid nitrogen cooled detector of X-rays | * EDX: Liquid nitrogen cooled detector of X-rays | ||
= Stage= | === Stage=== | ||
The eucentric stage is centered in (x=0,y=0) and has eucentric point at WD 5 mm. | The eucentric stage is centered in (x=0,y=0) and has eucentric point at WD 5 mm. | ||
* X range: 150 mm | * X range: 150 mm | ||
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* Tilt range: -10 to 60 degrees. | * Tilt range: -10 to 60 degrees. | ||
= Vent and pumpdown time= | === Vent and pumpdown time=== | ||
* Approximately 5 minutes combined. | * Approximately 5 minutes combined. | ||
= Accuracy and reproducibility= | == Accuracy and reproducibility== | ||
* A standardization procedure will be introduced soon. | * A standardization procedure will be introduced soon. | ||
= Energy Dispersive X-ray analysis= | == Energy Dispersive X-ray analysis== | ||
*Oxford Inca system installed for high performance EDX analysis. | *Oxford Inca system installed for high performance EDX analysis. | ||
= Micromanipulator= | == Micromanipulator== | ||
*A Kleindiek micromanipulator with a Capres 4 point probe is installed. | *A Kleindiek micromanipulator with a Capres 4 point probe is installed. | ||
=LEO SEM= | |||
==JEOL SEM== | ==JEOL SEM== | ||
Revision as of 19:55, 22 November 2007
At the moment we have three SEM's.
FEI SEM
Technical specifcations
Sample requirements
- The Nova NanoSEM analyzes a variety of samples, however, excluded are samples that may degas, disintegrate or produce dust/particles. Therefore, no wet polymers, powders etc. If you have any questions, please ask Jonas.
Sample sizes
- Up to 6" wafers.
SEM modes
- Mode 1: High Resolution SEM mode: This is the standard operation mode associated with SEM.
- Mode 2: Ultra High Resolution SEM mode: Magnetic fields generated in the chamber act as a virtual lens that engulfes the sample. Using this semi-immersion lens increased resolution may be achieved at high magnifications.
- Mode 3: EDX mode: Similar to Mode 1, but the electrons are trapped using a magnetic field.
Lateral resolution
The resolution that may be achieve is highly dependent on the type of sample and SEM operator skills. In the best cases one may expect:
- High Vacuum operation:
1.0 nm at 15 kV (TLD detector and optimum working distance) 1.8 nm at 1 kV (TLD detector and optimum working distance)
- Low Vacuum operation
1.5 nm at 10 kV (Helix detector and optimum working distance) 1.8 nm at 3 kV (Helix detector and optimum working distance)
Acceleration voltage
- 200 V - 30 kV
Detectors
- ETD: In chamber SE Detector (Everhardt Thornley Detector)
- TLD: Inlens SE detector (Through Lens Detector)
- BSED: BackScatter Electron Detector
- LVD: Low Vacuum SE Detector
- Helix: High resolution Low Vacuum detector
- GAD: Low Vacuum Backscatter Electron Detector (Gaseous Analytical Detector)
- EDX: Liquid nitrogen cooled detector of X-rays
Stage
The eucentric stage is centered in (x=0,y=0) and has eucentric point at WD 5 mm.
- X range: 150 mm
- Y range: 150 mm
- Z range: 10 mm
- Rotation: 360±
- Tilt range: -10 to 60 degrees.
Vent and pumpdown time
- Approximately 5 minutes combined.
Accuracy and reproducibility
- A standardization procedure will be introduced soon.
Energy Dispersive X-ray analysis
- Oxford Inca system installed for high performance EDX analysis.
Micromanipulator
- A Kleindiek micromanipulator with a Capres 4 point probe is installed.