Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions
Appearance
No edit summary |
|||
| Line 1: | Line 1: | ||
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation) click here]''' | |||
==Oxidation== | ==Oxidation== | ||
At Danchip we have seven furnaces for oxidation: A1, A3, C1, C2, C3, D1 and nobel. Oxidation can take place either by a dry process or a wet process. The film quality of dry oxide is better than for wet oxide with regards to density and dielectric constant. | At Danchip we have seven furnaces for oxidation: A1, A3, C1, C2, C3, D1 and nobel. Oxidation can take place either by a dry process or a wet process. The film quality of dry oxide is better than for wet oxide with regards to density and dielectric constant. | ||