Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace: Difference between revisions
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A1 is the top furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with furnace C2 are the cleanest of all our furnaces. Please be aware of which substrates are allowed to enter this furnace. Check [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 the cross contamination chart]. If you are in doubt, please send a mail to [mailto:furnace@danchip.dtu.dk furnace@danchip.dtu.dk]. | A1 is the top furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with furnace C2 are the cleanest of all our furnaces. Please be aware of which substrates are allowed to enter this furnace. Check [http://www.labmanager.danchip.dtu.dk/view_binary.php?fileId=1250 the cross contamination chart]. If you are in doubt, please send a mail to [mailto:furnace@danchip.dtu.dk furnace@danchip.dtu.dk]. | ||
'''The user manual(s), quality control procedure(s) and results | '''The user manual(s), quality control procedure(s) and results, technical information and contact information can be found in LabManager:''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=47 Bor Drive-in]''' | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=47 Bor Drive-in]''' |
Revision as of 14:27, 26 November 2012
A1 Furnace Boron drive-in
A1 Furnace boron drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide, drive-in of boron after a predeposition, oxidation of the boron phase layer. Boron predeposition takes place in the A2 Furnace boron pre-dep. It can also be used for drive in of boron which has been ion implanted.
A1 is the top furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with furnace C2 are the cleanest of all our furnaces. Please be aware of which substrates are allowed to enter this furnace. Check the cross contamination chart. If you are in doubt, please send a mail to furnace@danchip.dtu.dk.
The user manual(s), quality control procedure(s) and results, technical information and contact information can be found in LabManager:
Process knowledge
- Boron drive-in: look at the Dope with Boron page
- Oxidation: look at the Oxidation page
- Annealing: look at the Annealing page
Purpose | Drive-in of boron, oxidation of silicon and boron phase layer and annealing of the oxide | Oxidation:
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Performance | Film thickness |
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Process parameter range | Process Temperature |
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Process pressure |
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Gasses on the system |
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Substrates | Batch size |
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Substrate material allowed |
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