Specific Process Knowledge/Thin film deposition/Deposition of Tantalum: Difference between revisions
New page: Tantalum can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment. {| border="1" cellspacing="0" cellpadding="4" ! ! E-beam evapora... |
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! E-beam evaporation (Alcatel) | ! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Alcatel|Alcatel]]) | ||
! E-beam evaporation (Leybold) | ! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Leybold|Leybold]]) | ||
! Sputter (Lesker) | ! Sputter (Lesker) | ||
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