Specific Process Knowledge/Characterization: Difference between revisions
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== Choose equipment == | == Choose equipment == | ||
*[[/SEM: Scanning Electron Microscopy | *[[/SEM: Scanning Electron Microscopy|SEM FEI]] | ||
*[[/SEM: Scanning Electron Microscopy | *[[/SEM: Scanning Electron Microscopy|SEM LEO]] | ||
*[[/SEM: Scanning Electron Microscopy | *[[/SEM: Scanning Electron Microscopy|SEM JEOL]] | ||
*[[/SEM: Scanning Electron Microscopy|SEM Zeiss]] | |||
Revision as of 13:01, 21 November 2012
Choose topic
- Sample imaging
- Topographic measurement
- Stress measurement
- Measurement of film thickness and optical constants
- Wafer thickness measurement
- Element analysis
- Hydrophobicity measurement
- Resistivity measurement
- Other electrical measurements
Choose equipment