Specific Process Knowledge/Characterization: Difference between revisions
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===[[/SEM: Scanning Electron Microscopy|SEM: Scanning Electron Microscopy]]=== | ===[[/SEM: Scanning Electron Microscopy|SEM: Scanning Electron Microscopy]]=== | ||
*[[/SEM: Scanning Electron Microscopy | *[[/SEM: Scanning Electron Microscopy#FEI SEM|FEI SEM]] | ||
*[[/SEM: Scanning Electron Microscopy | *[[/SEM: Scanning Electron Microscopy#LEO SEM|LEO SEM]] | ||
*[[/SEM: Scanning Electron Microscopy | *[[/SEM: Scanning Electron Microscopy#JEOL SEM|JEOL SEM]] | ||
Revision as of 12:59, 21 November 2012
Choose topic
- Sample imaging
- Topographic measurement
- Stress measurement
- Measurement of film thickness and optical constants
- Wafer thickness measurement
- Element analysis
- Hydrophobicity measurement
- Resistivity measurement
- Other electrical measurements
Choose equipment
SEM: Scanning Electron Microscopy