Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Si etch: Difference between revisions
| Line 38: | Line 38: | ||
|- | |- | ||
|Etch rate [nm/min] | |Etch rate [nm/min] | ||
| | |18 | ||
|} | |} | ||
| Line 38: | Line 38: | ||
|- | |- | ||
|Etch rate [nm/min] | |Etch rate [nm/min] | ||
| | |18 | ||
|} | |} | ||