Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions
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It consists of two solutions: RCA1 and RCA2 plus diluted HF. A crucial part of the RCA clean is the oxidation by H<sub>2</sub>O<sub>2</sub>. Therefore the life time of the RCA solutions are limited by the presence of the H<sub>2</sub>O<sub>2</sub> which is highly volatile at 70 <sup>o</sup>C. | It consists of two solutions: RCA1 and RCA2 plus diluted HF. A crucial part of the RCA clean is the oxidation by H<sub>2</sub>O<sub>2</sub>. Therefore the life time of the RCA solutions are limited by the presence of the H<sub>2</sub>O<sub>2</sub> which is highly volatile at 70 <sup>o</sup>C. | ||
*The RCA1 contains: H<sub>2</sub>O, NH<sub>4</sub>OH and H<sub>2</sub>O<sub>2<sub> (5:1:1). It is used for removal of light organics, particles and metals. <br \> | *The RCA1 contains: H<sub>2</sub>O, NH<sub>4</sub>OH and H<sub>2</sub>O<sub>2</sub> (5:1:1). It is used for removal of light organics, particles and metals. <br \> | ||
*The RCA2 contains: H<sub>2</sub>O, HCl and H<sub>2</sub>O<sub>2</sub> (5:1:1). It is used for removal of alkalis, metal hydroxides, and residual metals. | *The RCA2 contains: H<sub>2</sub>O, HCl and H<sub>2</sub>O<sub>2</sub> (5:1:1). It is used for removal of alkalis, metal hydroxides, and residual metals. | ||