Specific Process Knowledge/Characterization/Topographic measurement: Difference between revisions
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|Substrate size | |Substrate size | ||
|4" or less | |4" or less | ||
| | |8" or less | ||
|6" or less | |6" or less | ||
|- | |- | ||
|Max. scan range xy | |Max. scan range xy | ||
|Line scan x: Full substrate size | |Line scan x: Full substrate size | ||
|Line scan x: | |Line scan x: 50µm to 200mm | ||
|90 µm square | |90 µm square | ||
|- | |- | ||
|Max. scan range z | |Max. scan range z | ||
| | | | ||
| | |50Å to 262µm | ||
|1 µm (can go up to 5 µm under special settings) | |1 µm (can go up to 5 µm under special settings) | ||
|- | |- | ||
| Line 54: | Line 54: | ||
|Tip radius | |Tip radius | ||
| | | | ||
| | |5 µm | ||
|<12 nm on standard cantilever | |<12 nm on standard cantilever | ||
|- | |- | ||
|} | |} | ||
Revision as of 12:53, 20 November 2007
Topographic measurements are measurements were you can measure hight differences on your substrate. If you measure in many spots of you substrate you can get a topographic image of your substrate.
AT DANCHIP we have three systems for topographic measurement:
- Tencor - Profiler for measuring micro structures
- Dektak - Profiler for measuring micro structures
- Nanoman - AFM for measuring nano structures
| Tencor | Dektak | Nanoman | |
|---|---|---|---|
| General description | Profiler for measuring micro structures | Profiler for measuring micro structures. Can do wafer mapping | AFM for measuring nanostructures and surface roughness |
| Substrate size | 4" or less | 8" or less | 6" or less |
| Max. scan range xy | Line scan x: Full substrate size | Line scan x: 50µm to 200mm | 90 µm square |
| Max. scan range z | 50Å to 262µm | 1 µm (can go up to 5 µm under special settings) | |
| Resolution xy | |||
| Resolution z | |||
| Min. feature size | |||
| Max. aspect ratio | ~1 with standard cantilever. | ||
| Tip radius | 5 µm | <12 nm on standard cantilever |