Specific Process Knowledge/Thermal Process/A4 Phosphor Pre-dep furnace: Difference between revisions
| Line 1: | Line 1: | ||
==A4 Furnace Phosphor pre-dep== | ==A4 Furnace Phosphor pre-dep== | ||
[[Image: | [[Image:C4helstak.jpg|thumb|300x300px|A1 Boron drive in furnace: positioned in cleanroom 2]] | ||
A4 is a furnace to dope Si wafers with Phosphor to make conductive lanes, etch stops etc. The doping source is Phosphoryl chloride (commonly called phosphorus oxychloride) is a colourless liquid with the formula POCL3. | A4 is a furnace to dope Si wafers with Phosphor to make conductive lanes, etch stops etc. The doping source is Phosphoryl chloride (commonly called phosphorus oxychloride) is a colourless liquid with the formula POCL3. | ||