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Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE magnetic stack etch: Difference between revisions

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danchip, nanotech
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danchip, nanotech
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===Process parameters for the acceptance test===
===Process parameters for the acceptance test===
To find the optimal parameters, Design of Experiments was applied, with the intervals shown on the figure below.
{| border="2" cellspacing="2" cellpadding="3"  
{| border="2" cellspacing="2" cellpadding="3"  
!Parameter
!Parameter
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