Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
Appearance
No edit summary |
|||
| Line 21: | Line 21: | ||
! LPCVD (TEOS) | ! LPCVD (TEOS) | ||
! PECVD | ! PECVD | ||
! Sputter technique (PVD co-sputter/evaporation) | ! Sputter technique [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon oxide in PVD co-sputter/evaporation|(PVD co-sputter/evaporation tool)]] | ||
|- | |- | ||
| Stoichiometry | | Stoichiometry | ||