Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride: Difference between revisions
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**with layers of silicon oxide or silicon (oxy)nitride | **with layers of silicon oxide or silicon (oxy)nitride | ||
*Quartz | *Quartz | ||
*Small amount of metal (in PECVD3) | *Small amount of metal < 5% of the wafer coverage (ONLY in PECVD3!) | ||
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